Intel Puts High-NA EUV into Production, but Stitching Still Has Something to Prove
Intel Foundry has officially transitioned ASML's high numerical aperture (High-NA) EUV lithography into volume production. However, the industry still faces the complex engineering challenge of stitching together larger chip designs that exceed the reticle limit of High-NA systems.
EE Times · 22 September 2026 · Read the original →
China crafts working 3nm gate-all-around transistors without EUV — stacked nanosheets target 3nm without EUV, but full node remains distant
Chinese researchers have successfully fabricated working 3nm gate-all-around (GAA) transistors using stacked nanosheets without relying on extreme ultraviolet (EUV) lithography. While this demonstrates a significant laboratory milestone, achieving a full, high-yield production node using alternative lithography remains a distant challenge.
Tom's Hardware · 22 September 2026 · Read the original →
Huawei shelves global AI chip rollout as China's own demand outstrips supply — 15,488-chip Atlas clusters leverage optical networking to counter Nvidia, scales to 120 EFLOPS
Huawei has paused the international rollout of its AI processors due to overwhelming domestic demand in China. The company's massive Atlas clusters, which scale up to 120 EFLOPS across 15,488 chips, rely heavily on advanced optical networking to bypass US-led hardware restrictions and rival Nvidia's performance.
Tom's Hardware · 22 September 2026 · Read the original →
AI Demand Will Keep DRAM Market Under Pressure
The relentless expansion of AI infrastructure is consuming massive amounts of memory, leading to persistent DRAM supply shortages. Industry analysts project that these supply constraints and elevated pricing will continue well into 2027.
EE Times · 22 September 2026 · Read the original →
Physics remains remarkably indifferent to the scale of the capital expenditure.
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